High Vacuum Sputtering System System Sychdarthu Uwch-wactod gan Yang Yang

Mae High Vacuum Sputtering System System Sychdarthu Uwch-wactod gan Yang Yang yn enillydd uchel ei barch o'r 2021 Gwobr Efydd A' Design Award mawreddog iawn yng Nghategori Cystadleuaeth Peiriannau.

EfyddPeiriannau· 2021

High Vacuum Sputtering System System Sychdarthu Uwch-wactod

gan Yang Yang

Cleient: Huaiyin Institute of Technology & Liaoning Petrochemical University

Enillydd Gwobr Efydd A' Design Award yn y Categori Peiriannau

74,560

Enillydd Gwobr Wedi'i Wirio

Gwirio Statws Gwobr ar gyfer #115788

Gweld yn A' Design Award Datganiad i'r Wasg Bathodyn Gwobr

Lliwiau

Y Dyluniad

Am High Vacuum Sputtering System System Sychdarthu Uwch-wactod

Mae'r System Sychdarthu Uwch-wactod yn beiriant sy'n dyddodi ffilmiau tenau metel a deuelectrig ar sylfaenau hyd at 300 milimetr. Mae'r system yn defnyddio ffynonellau sychdarthu magnetron a bwerir gan amledd radio, cerrynt union neu gerrynt union pylsedig, gan weithredu mewn modd sengl neu mewn modd cyd-ddyddodi. Mae strwythur modwlaidd yn caniatáu gosodiad, cludiant a chynhaliaeth syml. Gwneir y cas o ddur wedi'i rolio'n oer gyda ffurfio dalen fetel a gorffeniad chwistrellu, ffrâm fewnol o alwminiwm a chlawr acrylig llwyd tryleu. Mae'r sgrin reoli yn dilyn egwyddorion ergonomig.

Y Gydnabyddiaeth

Am y Gwobr Efydd A' Design Award

Mae High Vacuum Sputtering System System Sychdarthu Uwch-wactod yn enillydd Gwobr Efydd A' Design Award, cydnabyddiaeth hynod fawreddog a roddir i ddyluniadau rhagorol sydd yn nodedig am greadigrwydd, dyfeisgarwch a chraffter. Mae enillwyr Efydd yn arteffactau medrus iawn a thrawiadol o greadigol sydd yn dilysu profiad helaeth, dychymyg a dyfeisgarwch eu dylunwyr. Disgwylir i High Vacuum Sputtering System System Sychdarthu Uwch-wactod fod yn wrthrych uchel ei fri, a edmygir ac a anwylir, sydd yn nodedig o broffesiynol ac arloesol. Mae'r dyluniad buddugol hwn o Wobr Efydd A' Design Award yn ymgorffori arferion gorau mewn celf, gwyddoniaeth, dylunio a thechnoleg, ac yn rhagorol am ei sylw i fanylion. Mae High Vacuum Sputtering System System Sychdarthu Uwch-wactod yn bodloni anghenion yn odidog, yn cyffwrdd â dyheadau, yn swyno teimladau ac yn apelio at chwilfrydedd.

Y Tu Ôl i'r Dyluniad

Pecyn i'r Wasg

Credydau, aelodau tîm a manylion technegol a ddarparwyd gan y dylunydd.

Priodweddau Unigryw: This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
Dimensiynau a Phecynnu: Width 2800mm x Depth 1200mm x Height 1500mm
Tagiau: Vacuum magnetron sputtering, UHV SPUTTER，Large equipment
Technoleg Cynhyrchu: The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
Her Dylunio: The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
Ymchwil: On the market，this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
Ysbrydoliaeth: The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
Hyd y Prosiect: The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
Llif Gweithrediad: Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
Aelodau'r Tîm: Yang Yang
Lei Wang
Menghua Wang
Chi Rui
Yu Jiang
Shuchang Cui
Zhe Li
Cydnabyddiaeth Delweddau: Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.