High Vacuum Sputtering System Fakuümsputtersysteem troch Yang Yang

High Vacuum Sputtering System Fakuümsputtersysteem troch Yang Yang is in heech wurdearre winner fan de tige prestizjeuze 2021 A' Design Award yn Brûns yn de kompetysje-kategory Fabrikaazje- en Ferwurkingsmasinery Ûntwerp.

BrûnsMasinery· 2021

High Vacuum Sputtering System Fakuümsputtersysteem

troch Yang Yang

Klant: Huaiyin Institute of Technology & Liaoning Petrochemical University

A' Design Award yn Brûns Winner yn de kategory Masinery

74,560

Ferifiearre Priiswinner

Ferifiearje Prisstatus foar #115788

Besjoch by A' Design Award Parseberjocht Priisbadge

Kleuren

It Untwerp

Oer High Vacuum Sputtering System Fakuümsputtersysteem

Heechfakuümsputtersysteem is in masine dy't metalen en dielektryske tinne films oanbringt op substraten oant 300 millimeter. It systeem brûkt magnetronsputterboarnen dy't oandreaun wurde troch radiofrekwinsje, gelykstream of pulseare gelykstream, wurkjend yn inkelvoudige modus of yn kodepositoazjemodus. In modulêre struktuer makket ienfâldige ynstallaasje, transport en ûnderhâld mooglik. De behuzing is makke fan koudwalst stiel mei plaatmetaalfoarming en spuitôfwurking, in aluminium binnenframe en in trochsichtige griize acrylkap. It kontrolskerm folget ergonomyske prinsipes.

De Erkenning

Oer de A' Design Award yn Brûns

High Vacuum Sputtering System Fakuümsputtersysteem is in winner fan de A' Design Award yn Brûns, in heech prestisjeuze erkenning foar treflike ûntwerpen dy't har ûnderskiede troch kreativiteit, fernuft en tûkens. Brûnswinners binne tige feardige en opfallend kreative artefakten dy't de grutte ûnderfining, ferbylding en betochtsumens fan har ûntwerpers befêstigje. Fan High Vacuum Sputtering System Fakuümsputtersysteem wurdt ferwachte dat it in tige heech achte, bewûndere en dierber objekt is dat opmerklik profesjoneel en ynnovatyf is. Dit winnende ûntwerp fan de A' Design Award yn Brûns yntegrearret de bêste praktiken yn keunst, wittenskip, ûntwerp en technology en is treflik om syn omtinken foar detail. High Vacuum Sputtering System Fakuümsputtersysteem foldocht behoeften prachtich, reitsjet winsken, betsjoeveret gefoelens en sprekt nijsgjirrigens oan.

Efter it Untwerp

Parsepakket

Credits, teamleden en technyske details levere troch de ûntwerper.

Unike Eigenskippen: This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
Ofmjittingen & Ferpakking: Width 2800mm x Depth 1200mm x Height 1500mm
Labels: Vacuum magnetron sputtering, UHV SPUTTER，Large equipment
Produksjetechnology: The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
Untwerpútdaging: The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
Undersyk: On the market，this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
Ynspiraasje: The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
Projektdoer: The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
Operaasjestreamferrin: Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
Teamleden: Yang Yang
Lei Wang
Menghua Wang
Chi Rui
Yu Jiang
Shuchang Cui
Zhe Li
Ofbyldingskrediten: Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.