Lo dissènh High Vacuum Sputtering System Sistèma de Pulverizacion Catodica a Void per Yang Yang es un laureat autfo estimfo del prestigfo 2021 A' Design Award de Bronze dins la Categoria de Competfo Maquinària.
BronzeMaquinària· 2021
High Vacuum Sputtering System Sistèma de Pulverizacion Catodica a Void
per Yang Yang
Client : Huaiyin Institute of Technology & Liaoning Petrochemical University
Laureat del A' Design Award de Bronze dins la Categoria Maquinària
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A prepaus de High Vacuum Sputtering System Sistèma de Pulverizacion Catodica a Void
Lo Sistèma de Pulverizacion Catodica a Naut Void es una maquina que depausa de pellicules primas metallicas e dielectricas sus de substrats fins a 300 millimètres. Lo sistèma utiliza de fonts de pulverizacion magnetron alimentadas per radiofrequéncia, corrent contunh o corrent contunh pulsat, foncionant en mòde individual o en mòde de co-depaus. Una estructura modulara permet una installacion, un transpòrt e un manteniment simples. Lo bastiment es fabricat en acièr laminat a freg amb formatge de tòla e finicion per pulverizacion, un cadre intèrn en aluminium e una cobèrta en acrilic gris translucid. L'ecran de contraròtle seguís de principis ergonomics.
La Reconoissença
A prepaus del A' Design Award de Bronze
High Vacuum Sputtering System Sistèma de Pulverizacion Catodica a Void a ganhat la distincion A' Design Award de Bronze, una reconeissença plan prestigiosa acordada a de designs excellents que se destrian per la creativitat, l'engenh e la finessa. Los ganhaires del Bronze son d'artefactes largament abils e sorprenentament creatius que provan la vasta experiéncia, l'imaginacion e l'engenhositat de lors designers. S'espèra que High Vacuum Sputtering System Sistèma de Pulverizacion Catodica a Void siá un objècte fòrça considerat, admirat e estimat, notablament professional e innovant. Aqueste design ganhaire de la distincion A' Design Award de Bronze integra las melhoras practicas de l'art, de la sciéncia, del design e de la tecnologia e es excellent per son atencion al detalh. High Vacuum Sputtering System Sistèma de Pulverizacion Catodica a Void satisfa esplendidament los besonhs, toca los desirs, encanta los sentiments e interèssa la curiositat.
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Kit de premsa
Crèdits, membres de l'equipa e detalhs tecnics fornits pel designer.
- Proprietats Unicas
- This Ultra High Vacuum Sputtering System subverts the traditional model. On the basis of the functional machine, it integrates many factors for industrial design according to the requirements of the users and the environments. This system mainly adopts modular combination mode, which is convenient for combined installation, transportation and maintenance.The overall shape design is neat and beautiful, the surface treatment is fine, the fuselage is matched with the translucent acrylic mask in gray tone, giving people a simple, modern and beautiful feeling. Ergonomics and interactions are reflected in the design of the control screen.
- Dimensions e Embalatge
- Width 2800mm x Depth 1200mm x Height 1500mm
- Etiquetas
- Vacuum magnetron sputtering, UHV SPUTTER，Large equipment
- Tecnologia de Produccion
- The main material of the shell is high quality cold plate, which uses sheet metal forming process and environmental protection spray technology, internal skeleton for aluminum, mask for acrylic material. The fuselage design adopts screen printing process.
- Desaffo de Dissènh
- The most difficult part of this design exercise is the matching relationship between the whole system, the operating mode, ergonomic design, and the interaction design in the control system.
- Recèrca
- On the market，this kind of products are mainly functional machines, lack of ergonomic design. The surface treatment and texture of material are rough, the modelling lack modern design sense. The Ultra High Voltage Sputter System is a school-enterprise cooperation project completed by designers and engineers jointly. This is an improved product design based on the university's scientific research background and technical conditions of the update and improvement.
- Inspiracion
- The Ultra High Vacuum Sputtering System is used in world-famous research laboratories of superconducting and quantum devices. The market is dominated by functional machines with bare devices and circuits, which don’t match the modern and intelligent test environment. Therefore, the integrated design of the system should be carried out to ensure the overall beautiful appearance design, in line with the ergonomic control design and the innovative design of human-computer interaction.
- Durada del Projècte
- The project began in January 2020 in Huai 'an, Jiangsu Province, China, and ended in November 2020 in Huai 'an, Jiangsu Province, China.
- Flux Operacional
- Ultra High Vacuum Sputtering System can deposit metal and dielectric thin films on substrates up to 300mm. Magnetron sputtering sources using RF, DC, or pulsed DC power sources can operate in single mode or co-deposition mode to produce films that meet a wide range of requirements.
- Membres de l'Equipa
- Yang Yang
Lei Wang
Menghua Wang
Chi Rui
Yu Jiang
Shuchang Cui
Zhe Li - Crèdits d'Imatges
- Image #1: Photographer Yang Yang, Variations, 2020.
Image #2: Photographer Lei Wang, Variations, 2020.
Image #3: Photographer Menghua Wang, Variations, 2020.
Image #4: Photographer Lei Wang, Variations, 2020.
Image #5: Photographer Lei Wang, Variations, 2020.
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